Trauma Room One

Surveys key research challenges and recent results of manufacturability aware routing in nanometer VLSI designs. The manufacturing challenges have their root causes from various integrated circuit manufacturing processes and steps, e.g., deep sub-wavelength lithography, random defects, via voids, chemical-mechanical polishing, and antenna-effects.

Ancheteaza provocarile cheie ale cercetarii si rezultatele recente ale rutei constiente de fabricabilitate in proiectele VLSI nanometrice. Provocarile de fabricatie au cauzele lor fundamentale din diverse procese si pasi de fabricatie a circuitelor integrate, de exemplu, litografie profunda sub lungime de unda, defecte aleatorii, prin goluri, lustruire chimico-mecanica si efecte de antena.